Watanabe Satoshi, Kimura Hideto, Sato Takahiro, Shibata Hirobumi, Sakamoto Fumitaka, Azumi Reiko, Sakai Hideki, Abe Masahiko, Matsumoto Mutsuyoshi
Departments of Materials Science and Technology, Tokyo University of Science, Yamazaki 2641, Noda, Japan.
Langmuir. 2008 Aug 19;24(16):8735-41. doi: 10.1021/la800805r. Epub 2008 Jul 23.
We report a versatile method to confine metal thin films in micro- and nanopatterns using directed self-assembly on the templates fabricated from phase-separated mixed Langmuir-Blodgett (LB) films. The pattern of the mixed LB films can be tuned by adjusting intermolecular interaction between the film-forming molecules in the LB films and by varying the fabrication conditions of the films such as the mixing ratio, subphase temperature, and surface pressure. We use the patterned LB films for templates to confine metal in patterned regions, taking advantage of the difference between the surface free energy of the patterned regions and that of the self-assembled monolayer of the silane coupling agent. Au nanoparticles are confined onto the patterned films as a catalyst for the succeeding Cu electroless deposition. The atomic force microscopic images, Auger electron spectra, and scanning Auger electron maps of a Cu-deposited film show that Cu is selectively deposited on the patterns of phase separation of the original mixed LB films.
我们报道了一种通用方法，该方法利用在由相分离混合朗缪尔-布洛杰特（LB）膜制备的模板上进行定向自组装，将金属薄膜限制在微米和纳米图案中。混合LB膜的图案可以通过调节LB膜中成膜分子之间的分子间相互作用以及改变膜的制备条件（如混合比例、亚相温度和表面压力）来调整。我们利用图案化区域与硅烷偶联剂自组装单分子层的表面自由能差异，将图案化LB膜用作模板，将金属限制在图案化区域中。金纳米颗粒被限制在图案化膜上，作为后续铜化学沉积的催化剂。铜沉积膜的原子力显微镜图像、俄歇电子能谱和扫描俄歇电子图表明，铜选择性地沉积在原始混合LB膜相分离的图案上。
