用于热红外和强二氧化碳激光脉冲的超高真空低温和高温硅玻璃腔室。

Ultrahigh vacuum low- and high-temperature silicon-glass cell for thermal infrared and intense CO2 laser pulses.

作者信息

Heidberg J, Hussla I, Hoefs E, Stein H, Nestmann A

机构信息

Institut für Physikalische und Theoretische Chemie der Universität, Erlangen-Nürnberg, Erlangen, West Germany.

出版信息

Rev Sci Instrum. 1978 Nov;49(11):1571. doi: 10.1063/1.1135312.

DOI:10.1063/1.1135312

PMID:18699005

Abstract

A durable flame sealed silicon glass infrared cell for use at ultrahigh vacuum (< or approximately 4 x 10(-8) Pa) and temperatures between 77 and 600 K is described. The cell is suitable for thermal infrared as well as MW/cm(2) CO(2) laser pulses of 1 J energy. It can be fused directly onto a glass to stainless steel seal on a standard Conflat flange, thus making a variable temperature metal seal onto a metal UHV system. The integral leak rate and the ir transmission of the cell were measured. Infrared chemical applications are described.

摘要

描述了一种用于超高真空（<或约4×10⁻⁸帕）和77至600 K温度之间的耐用火焰密封硅玻璃红外池。该池适用于热红外以及能量为1焦耳的兆瓦/平方厘米二氧化碳激光脉冲。它可以直接熔接到标准康弗法兰上的玻璃与不锈钢密封处，从而在金属超高真空系统上形成可变温度的金属密封。测量了该池的整体泄漏率和红外透射率。还描述了红外化学应用。