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用于高电流离子注入机的微波离子源。

Microwave ion source for high-current implanter.

作者信息

Sakudo N, Tokiguchi K, Koike H, Kanomata I

机构信息

Central Research Laboratory, Hitachi Limited, Kokubunji, Tokyo 185, Japan.

出版信息

Rev Sci Instrum. 1978 Jul;49(7):940. doi: 10.1063/1.1135499.

DOI:10.1063/1.1135499
PMID:18699229
Abstract

A long-life, high-current, microwave ion source for an electromagnetic mass separator is described. Ionization takes place due to the 2.45-GHz microwave discharge at a magnetic field intensity which is higher than the electron cyclotron resonance magnetic field. The discharge chamber is a ridged circular waveguide. The discharge region is restricted to a rectangular volume between the ridged electrodes by filling the remaining portions with dielectric. This source operates under low pressure (10(-2)-10(-3) Torr) and with high power efficiency. The incident microwave power is only several hundred watts at maximum output. When PH(3) gas is introduced, the total extracted current is about 40 mA with a 2x40-mm extraction slit. A P(+) ion implantation current of more than 10 mA is obtained by combining the source with a 40-cm radius, 60 degrees deflection magnetic mass separator.

摘要

描述了一种用于电磁质量分离器的长寿命、高电流微波离子源。电离是由于在高于电子回旋共振磁场的磁场强度下的2.45 GHz微波放电而发生的。放电室是一个带脊的圆形波导。通过用介质填充其余部分,放电区域被限制在带脊电极之间的矩形体积内。该源在低压(10^(-2)-10^(-3)托)下运行且具有高功率效率。最大输出时入射微波功率仅为几百瓦。当引入PH(3)气体时,通过2x40毫米的引出狭缝,总引出电流约为40 mA。通过将该源与半径为40厘米、偏转角度为60度的磁质量分离器相结合,可获得超过10 mA的P(+)离子注入电流。

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引用本文的文献

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