Natsuaki N, Ohyu K, Tokuyama T
Central Research Laboratory, Hitachi Ltd., Kokubunji, Tokyo 185, Japan.
Rev Sci Instrum. 1978 Sep;49(9):1300. doi: 10.1063/1.1135572.
A technique is described for direct and precise monitoring of the spatial dose uniformity of an electrically scanned ion beam. The method employs a two-dimensional 10x10 array of Faraday cups, individually connected to a current integrator, to measure local dose distribution. It also employs a microprocessor for rapid data processing and topographic data display. The technique is applicable to high quality ion implantation processes as a uniformity monitor with an accuracy of 1%. In addition, a new concept for uniform ion beam scanning is proposed.
本文描述了一种用于直接精确监测电扫描离子束空间剂量均匀性的技术。该方法采用一个二维10×10法拉第杯阵列，每个法拉第杯单独连接到一个电流积分器，以测量局部剂量分布。它还采用一个微处理器进行快速数据处理和地形数据显示。该技术作为一种均匀性监测器，适用于高质量离子注入工艺，精度可达1%。此外，还提出了一种均匀离子束扫描的新概念。
