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一种用于电子束泵浦激光器中瞬态相移测量的干涉测量技术。

An interferometric technique for transient phase shift measurements in an electron-beam-pumped laser.

作者信息

Scheps R, Hunter R O, Oldenettel J R

机构信息

Maxwell Laboratories, Inc., 9244 Balboa Avenue, San Diego, California 92123, USA.

出版信息

Rev Sci Instrum. 1979 Sep;50(9):1054-61. doi: 10.1063/1.1136009.

Abstract

An interferometric technique designed to measure optical homogeneity in an electron-beam-pumped plasma is described and characterized. The system provides a two-dimensional transient phase shift contour mapping of the excited region, at any time during or after the excitation pulse. The basic instrument is a 7-cm-field, 5-m Mach-Zehnder type interferometer coupled to a specially configured 2-m e-beam-pumped sample chamber. By virture of ''e-beam partitioning,'' absolute fringe shifts can be measured in a single shot. This relaxes the usually severe requirements on vibration isolation associated with systems of this size, and simplifies the overall mainframe construction. A short-pulse XeF discharge laser, developed specifically for this application, is also described, and sample interferograms are presented for e-beam-pumped noble gas and noble gas-NF3 mixtures. A ray calculus model is applied to the analytical interpretation of the interferograms produced by this technique. This model has general applicability to ray propagation in graded index media and is discussed in some detail.

摘要

本文描述并表征了一种用于测量电子束泵浦等离子体光学均匀性的干涉测量技术。该系统可在激发脉冲期间或之后的任何时刻,提供激发区域的二维瞬态相移轮廓映射。基本仪器是一个7厘米场、5米长的马赫-曾德尔型干涉仪,与一个特殊配置的2米长电子束泵浦样品室相连。借助“电子束分区”,可以单次测量绝对条纹位移。这放宽了与这种尺寸系统相关的通常对隔振的严格要求,并简化了整体主机结构。还介绍了专门为此应用开发的短脉冲XeF放电激光器,并给出了电子束泵浦稀有气体和稀有气体-NF3混合物的样品干涉图。将射线计算模型应用于该技术产生的干涉图的分析解释。该模型普遍适用于渐变折射率介质中的射线传播,并进行了详细讨论。

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