Khan N A, Mir M R, Nazar R, Singh S
Department of Botany, Aligarh Muslim University, Aligarh, India.
Plant Biol (Stuttg). 2008 Sep;10(5):534-8. doi: 10.1111/j.1438-8677.2008.00054.x.
Ethephon (2-chloroethyl phosphonic acid), an ethylene-releasing compound, influences growth and photosynthesis of mustard (Brassica juncea L. Czern & Coss.). We show the effect of nitrogen availability on ethylene evolution and how this affects growth, photosynthesis and nitrogen accumulation. Ethylene evolution in the control with low N (100 mg N kg(-1) soil) was two-times higher than with high N (200 mg N kg(-1) soil). The application of 100-400 microl x l(-1) ethephon post-flowering, i.e. 60 days after sowing, on plants receiving low or high N further increased ethylene evolution. Leaf area, relative growth rate (RGR), photosynthesis, leaf nitrate reductase (NR) activity and leaf N reached a maximum with application of 200 microl x l(-1) ethephon and high N. The results suggest that the application of ethephon influences growth, photosynthesis and N accumulation, depending on the amount of nitrogen in the soil.
乙烯利（2-氯乙基膦酸）是一种能释放乙烯的化合物，会影响芥菜（Brassica juncea L. Czern & Coss.）的生长和光合作用。我们展示了氮素供应对乙烯释放的影响以及这如何影响生长、光合作用和氮素积累。低氮（100毫克氮/千克土壤）对照中的乙烯释放量比高氮（200毫克氮/千克土壤）对照高两倍。在播种60天后开花期，对低氮或高氮植株施用100 - 400微升/升乙烯利会进一步增加乙烯释放量。叶面积、相对生长速率（RGR）、光合作用、叶片硝酸还原酶（NR）活性和叶片氮含量在施用200微升/升乙烯利和高氮时达到最大值。结果表明，根据土壤中的氮含量，施用乙烯利会影响生长、光合作用和氮素积累。
