du Plessis H, van Staden J F
Department of Chemistry, University of Pretoria, Pretoria 0002, South Africa.
Talanta. 2000 May 31;52(1):83-90. doi: 10.1016/s0039-9140(00)00322-2.
Sulphuric acid in process effluent streams from an electrorefining copper plant was analysed with a sequential injection (SI) titration system using sodium hydroxide as titrant. In the proposed SI titration system a base titrant, acid analyte and base titrant zone were injected sequentially into a distilled water carrier stream in a holding coil and swept by flow reversal through a reaction coil to the detector. The base zones contained bromothymol blue as indicator and the endpoint was monitored spectrophotometrically at 620 nm. The influence of carrier stream flow rate, acid and base zone volumes and titrant concentration on the linear range of the method was studied to obtain an optimum. A linear relationship between peak width and logarithm of the acid concentration was obtained in the range 0.006-0.178 mol l(-1) of H(2)SO(4) for a NaOH concentration of 0.002 mol l(-1). The results obtained for the SI titration of process samples were in good agreement with a standard potentiometric method with an RSD<0.75% and a sample frequency of 23 samples h(-1).
采用氢氧化钠作为滴定剂,利用顺序注射(SI)滴定系统对某电精炼铜厂工艺废水流中的硫酸进行了分析。在所提出的SI滴定系统中,将一种碱滴定剂、酸性分析物和碱滴定剂区依次注入到保持盘管中的蒸馏水载流中,并通过流动反转扫过反应盘管到达检测器。碱区含有溴百里酚蓝作为指示剂,并在620 nm处用分光光度法监测终点。研究了载流流速、酸区和碱区体积以及滴定剂浓度对该方法线性范围的影响以获得最佳条件。对于0.002 mol l(-1)的NaOH浓度,在0.006 - 0.178 mol l(-1)的H(2)SO(4)范围内,获得了峰宽与酸浓度对数之间的线性关系。对工艺样品进行SI滴定得到的结果与标准电位法吻合良好,相对标准偏差(RSD)<0.75%,样品频率为每小时23个样品。