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一种用于通过硬X射线散射和光谱对超薄薄膜进行原位研究的紧凑型超高真空沉积系统。

A compact UHV deposition system for in situ study of ultrathin films via hard x-ray scattering and spectroscopy.

作者信息

Couet Sebastien, Diederich Thomas, Schlage Kai, Röhlsberger Ralf

机构信息

Deutsches Elektronen Synchrotron (DESY), Notkestrasse 85, 22603 Hamburg, Germany.

出版信息

Rev Sci Instrum. 2008 Sep;79(9):093908. doi: 10.1063/1.2982059.

DOI:10.1063/1.2982059
PMID:19044429
Abstract

We report on a compact ultrahigh vacuum deposition system developed for in situ experiments using hard x rays. The chamber can be mounted on various synchrotron beamlines for spectroscopic as well as scattering experiments in grazing incidence geometry. The deposition process is completely remotely controlled and an ellipsometer is available for online monitoring of the layer growth process. The unique sample position in the chamber allows one to perform deposition, grazing incidence x-ray experiments, and ellipsometry measurements at the same time, enabling to correlate the x-ray analysis with parameters of the growth process. Additionally, the setup can be used to study in situ chemical and structural changes in an element specific manner by x-ray absorption spectroscopy. The flexibility and versatility of the system brings new possibilities to study the chemistry and structure of surfaces and interfaces in thin films systems during their formation.

摘要

我们报告了一种为使用硬X射线进行原位实验而开发的紧凑型超高真空沉积系统。该腔室可安装在各种同步加速器光束线上,用于掠入射几何构型下的光谱学以及散射实验。沉积过程完全由远程控制,并且有一台椭偏仪可用于在线监测层生长过程。腔室内独特的样品位置允许同时进行沉积、掠入射X射线实验和椭偏测量,从而能够将X射线分析与生长过程的参数相关联。此外,该装置可用于通过X射线吸收光谱以元素特异性方式研究原位化学和结构变化。该系统的灵活性和多功能性为研究薄膜系统形成过程中表面和界面的化学与结构带来了新的可能性。

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