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用于平场极紫外光谱仪的三种不同光栅的光谱评估,该光谱仪用于监测10 - 30埃范围内中Z杂质的Δn = 1跃迁。

Spectroscopic evaluation of three different gratings used for a flat-field extreme ultraviolet spectrometer to monitor Delta n=1 transitions from medium-Z impurities in 10-30 A.

作者信息

Chowdhuri Malay Bikas, Morita Shigeru, Goto Motoshi, Sasai Hiroyuki

机构信息

Department of Fusion Science, Graduate University for Advanced studies, Toki, Gifu 509-5292, Japan.

出版信息

Rev Sci Instrum. 2008 Oct;79(10):10F537. doi: 10.1063/1.2953678.

Abstract

Spectral characteristics of varied line spacing 2400 grooves/mm gratings used for a flat-field extreme ultraviolet spectrometer have been evaluated to monitor Delta n=1 (n=2-3) transitions from medium-Z impurities in 10-30 A, where many spectral lines from metallic impurities closely exist. For this purpose emission spectra of the Delta n=1 transitions from partially L-shell-ionized Ti and Fe have been measured in large helical device. At first, a ruled and a holographic grating were utilized for the comparative study. Both gratings suppressed higher order light effectively but spectral sensitivity was much higher for the holographic grating. The ruled grating, however, attained better spectral resolution (0.083 A at 18.97 A) in the 10-100 A range compared to that (0.130 A) of the holographic grating. After that a recently developed new holographic grating with different laminar shapes and line spacings has attempted to improve the spectral resolution. As a result, it has considerably improved the spectral resolution in the 10-30 A range, i.e., approximately 0.090 A. However, it is found that the experimentally obtained spectral resolution is quit poor compared to the computationally simulated one, suggesting a technical difficulty in manufacturing exactly the varied line spacing of the holographic grating at such a short wavelength range.

摘要

已对用于平场极紫外光谱仪的不同线间距(2400 条刻线/毫米)光栅的光谱特性进行了评估,以监测 10 - 30 埃范围内中 Z 杂质的Δn = 1(n = 2 - 3)跃迁,该范围内存在许多来自金属杂质的光谱线。为此,在大型螺旋装置中测量了部分 L 壳层电离的 Ti 和 Fe 的Δn = 1 跃迁的发射光谱。首先,使用了刻划光栅和全息光栅进行对比研究。两种光栅都有效地抑制了高阶光,但全息光栅的光谱灵敏度要高得多。然而,与全息光栅(0.130 埃)相比,刻划光栅在 10 - 100 埃范围内获得了更好的光谱分辨率(在 18.97 埃处为 0.083 埃)。此后,尝试使用最近开发的具有不同层状形状和线间距的新型全息光栅来提高光谱分辨率。结果,它在 10 - 30 埃范围内显著提高了光谱分辨率,即约为 0.090 埃。然而,发现实验获得的光谱分辨率与计算模拟的分辨率相比相当差,这表明在如此短的波长范围内精确制造全息光栅的可变线间距存在技术困难。

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