基于光热辐射测量法的厚度显微镜用于薄膜测量。
Thickness microscopy based on photothermal radiometry for the measurement of thin films.
作者信息
Wang Liping, Prekel Helmut, Liu Hengbiao, Deng Yanzhuo, Hu Jiming, Goch Gert
机构信息
College of Chemistry and Molecular Science, Wuhan University, Wuhan, Hubei Province 430072, People's Republic of China.
出版信息
Spectrochim Acta A Mol Biomol Spectrosc. 2009 Mar;72(2):361-5. doi: 10.1016/j.saa.2008.10.009. Epub 2008 Oct 25.
The photothermal detection technique is an innovative and non-contact method to investigate the properties of films on workpieces. This paper describes a novel experimental set-up for thickness microscopy based on photothermal radiometry. The correlation between the thermal wave signal and the film thickness is deduced and evaluated to determine the film thickness with a lateral resolution of less than 1mm. Results indicate that the thickness microscopy is a useful method to characterize thin films and has the potential to be applied in-process.
光热检测技术是一种用于研究工件上薄膜特性的创新型非接触方法。本文描述了一种基于光热辐射测量法的新型厚度显微镜实验装置。推导并评估了热波信号与薄膜厚度之间的相关性，以确定横向分辨率小于1毫米的薄膜厚度。结果表明，厚度显微镜是表征薄膜的一种有用方法，并且有在加工过程中应用的潜力。
Zotero 插件