Shariq A, Mutas S, Wedderhoff K, Klein C, Hortenbach H, Teichert S, Kücher P, Gerstl S S A
Fraunhofer-Center Nanoelectronic Technology, Koenigsbruecker Strasse 180, D-01099 Dresden, Germany.
Ultramicroscopy. 2009 Apr;109(5):472-9. doi: 10.1016/j.ultramic.2008.10.001. Epub 2008 Nov 1.
Atom Probe Tomography (APT) consists of analyzing a needle-shaped specimen on an atom-by-atom basis. In recent years, instruments have become commercially available, enabling the sequential analysis of the same specimen in both laser- and voltage-pulsed modes. In this contribution, a comparison of field evaporated end-forms as a function of the voltage and laser power is presented for silicon. Electron microscopy is utilized for visual inspection of the final tip end-forms. The field of evaporation for silicon is calculated based on these radius measurements for voltage and laser pulsing. Electron microscopy and analysis of the atom probe data show that the specimen end-forms for both pulsing modes can be different. We have observed two effects on the shape of a field-ion emitter when irradiated by a focused laser beam. One is a change in the 3-dimensional topology of the emitter due to different crystallographic orientations. Secondly, exposure to focused laser beam from one side may lead to a non-hemispherical tip shape especially when reasonably high laser energy is utilized. For comparison purposes to the laser mode, the voltage pulse evaporated tip end form is also analyzed for different specimen temperatures. Consequently, evaporation fields are calculated for different temperatures and laser conditions for silicon.
原子探针断层扫描(APT)包括对针状样品进行逐个原子分析。近年来,相关仪器已实现商业化,能够在激光脉冲模式和电压脉冲模式下对同一样品进行顺序分析。在本论文中,给出了硅作为电压和激光功率函数的场蒸发最终形态的比较。利用电子显微镜对最终尖端形态进行目视检查。基于这些电压和激光脉冲的半径测量结果计算硅的蒸发场。电子显微镜和原子探针数据分析表明,两种脉冲模式下的样品最终形态可能不同。我们观察到聚焦激光束照射场离子发射体时对其形状有两种影响。一种是由于不同的晶体取向导致发射体三维拓扑结构发生变化。其次,从一侧暴露于聚焦激光束可能会导致非半球形的尖端形状,特别是在使用相当高的激光能量时。为了与激光模式进行比较,还分析了不同样品温度下电压脉冲蒸发的尖端最终形态。因此,计算了硅在不同温度和激光条件下的蒸发场。