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培养的嗜铬细胞中二磷酸腺苷四磷酸(Ap4A)结合位点的表征:P2y位点的证据。

Characterization of diadenosine tetraphosphate (Ap4A) binding sites in cultured chromaffin cells: evidence for a P2y site.

作者信息

Pintor J, Torres M, Castro E, Miras-Portugal M T

机构信息

Departamento de Bioquímica, Facultad de Veterinaria, Universidad Complutense de Madrid, Spain.

出版信息

Br J Pharmacol. 1991 Aug;103(4):1980-4. doi: 10.1111/j.1476-5381.1991.tb12363.x.

Abstract
  1. Diadenosine tetraphosphate (Ap4A) a dinucleotide, which is stored in secretory granules, presents two types of high affinity binding sites in chromaffin cells. A Kd value of 8 +/- 0.65 x 10(-11) M and Bmax value of 5420 +/- 450 sites per cell were obtained for the high affinity binding site. A Kd value of 5.6 +/- 0.53 x 10(-9) M and a Bmax value close to 70,000 sites per cell were obtained for the second binding site with high affinity. 2. The diadenosine polyphosphates, Ap3A, Ap4A, Ap5A and Ap6A, displaced [3H]-Ap4A from the two binding sites, the Ki values being 1.0 nM, 0.013 nM, 0.013 nM and 0.013 nM for the very high affinity binding site and 0.5 microM, 0.13 microM, 0.062 microM and 0.75 microM for the second binding site. 3. The ATP analogues displaced [3H]-Ap4A with the potency order of the P2y receptors, adenosine 5'-O-(2 thiodiphosphate) (ADP-beta-S) greater than 5'-adenylyl imidodiphosphate (AMP-PNP) greater than alpha, beta-methylene ATP (alpha, beta-MeATP), in both binding sites. The Ki values were respectively 0.075 nM, 0.2 nM and 0.75 nM for the very high affinity binding site and 0.125 microM, 0.5 microM and 0.9 microM for the second binding site.
摘要
  1. 四磷酸二腺苷(Ap4A)是一种二核苷酸,储存于分泌颗粒中,在嗜铬细胞中呈现出两种高亲和力结合位点。高亲和力结合位点的解离常数(Kd)值为8±0.65×10⁻¹¹ M,每个细胞的最大结合量(Bmax)值为5420±450个位点。第二个高亲和力结合位点的Kd值为5.6±0.53×10⁻⁹ M,每个细胞的Bmax值接近70000个位点。2. 多磷酸二腺苷Ap3A、Ap4A、Ap5A和Ap6A从这两个结合位点取代了[³H]-Ap4A,对于极高亲和力结合位点,其抑制常数(Ki)值分别为1.0 nM、0.013 nM、0.013 nM和0.013 nM,对于第二个结合位点,Ki值分别为0.5 μM、0.13 μM、0.062 μM和0.75 μM。3. 在两个结合位点上,ATP类似物取代[³H]-Ap4A的效力顺序与P2y受体相同,即5'-O-(2-硫代二磷酸)腺苷(ADP-β-S)>5'-腺苷酰亚胺二磷酸(AMP-PNP)>α,β-亚甲基ATP(α,β-MeATP)。对于极高亲和力结合位点,Ki值分别为0.075 nM、0.2 nM和0.75 nM,对于第二个结合位点,Ki值分别为0.125 μM、0.5 μM和0.9 μM。

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