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用于浸没式光刻的高折射率纳米复合流体。

High refractive index nanocomposite fluids for immersion lithography.

作者信息

Bremer L, Tuinier R, Jahromi S

机构信息

DSM Research, ACES, P.O. Box 18, 6160 MD Geleen, The Netherlands, and DSM Licensing, P.O. Box 53, 6160 AB Geleen, The Netherlands.

出版信息

Langmuir. 2009 Feb 17;25(4):2390-401. doi: 10.1021/la8026896.

Abstract

The concept of using dispersions of nanoparticles as high refractive index fluids in immersion lithography is examined both from a theoretical and experimental point of view. In the theoretical part we show that gelation and demixing can be controlled in high solid dispersions, needed to achieve a high (refractive) index, by using short stabilizing brushes. We considered both fluid-fluid demixing by using statistical thermodynamics and percolation, computed using liquid-state approaches. Whenever demixing or percolation takes place, the nanoparticle dispersion is unsuited for immersion lithography. The minimum thickness of the stabilizer layer of a stable suspension is estimated assuming particles plus steric stabilizer to act as hard spheres with van der Waals attraction between the cores. Since the van der Waals attraction can be related to the optical properties of the particles and dispersion medium, it is also possible to estimate the refractive index that can be attained with composite immersion fluids. Using materials that are known to be highly transparent in the bulk at a wavelength of 193 nm, indices above 1.8 can be attained. Other materials with higher indices are expected to be transparent at 193 nm due to a blue shift of the UV absorption and enable much higher indices. In the experiment, we show that it is possible to prepare suspensions with particles of about 4 nm diameter that increase the refractive index of the continuous phase with 0.2 at a wavelength of 193 nm. The refractive index and density of such dispersions are proportional to the volume fraction of the disperse phase, and it is shown that the refractive index of the composite fluid can be predicted very well from the optical properties of the components. Furthermore, successful imaging experiments were performed through a dispersion of silica nanoparticles. These findings lead to the conclusion that immersion lithography using nanoparticle dispersions is indeed possible.

摘要

从理论和实验的角度研究了将纳米颗粒分散体用作浸没光刻中高折射率流体的概念。在理论部分,我们表明,通过使用短的稳定刷,可以在实现高(折射)指数所需的高固含量分散体中控制凝胶化和分层现象。我们使用统计热力学考虑了流体-流体分层现象,并使用液态方法计算了渗滤现象。每当发生分层或渗滤时,纳米颗粒分散体就不适合用于浸没光刻。假设颗粒加空间稳定剂作为具有核心间范德华吸引力的硬球,估计了稳定悬浮液稳定剂层的最小厚度。由于范德华吸引力可以与颗粒和分散介质的光学性质相关,因此也可以估计复合浸没流体可以达到的折射率。使用已知在193nm波长下整体高度透明的材料,可以获得高于1.8的折射率。由于紫外线吸收的蓝移,预计其他具有更高折射率的材料在193nm处是透明的,并能实现更高的折射率。在实验中,我们表明可以制备直径约为4nm的颗粒的悬浮液,其在193nm波长下使连续相的折射率增加0.2。这种分散体的折射率和密度与分散相的体积分数成正比,并且表明复合流体的折射率可以根据组分的光学性质很好地预测。此外,通过二氧化硅纳米颗粒分散体进行了成功的成像实验。这些发现得出结论,使用纳米颗粒分散体的浸没光刻确实是可行的。

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