Huang Fu Min, Zheludev Nikolay I
Optoelectronics Research Centre, University of Southampton SO17 1BJ, United Kingdom.
Nano Lett. 2009 Mar;9(3):1249-54. doi: 10.1021/nl9002014.
The past decade has seen numerous efforts to achieve imaging resolution beyond that of the Abbe-Rayleigh diffraction limit. The main direction of research aiming to break this limit seeks to exploit the evanescent components containing fine detail of the electromagnetic field distribution at the immediate proximity of the object. Here, we propose a solution that removes the need for evanescent fields. The object being imaged or stimulated with subwavelength accuracy does not need to be in the immediate proximity of the superlens or field concentrator: an optical mask can be designed that creates constructive interference of waves known as superoscillation, leading to a subwavelength focus of prescribed size and shape in a field of view beyond the evanescent fields, when illuminated by a monochromatic wave. Moreover, we demonstrate that such a mask may be used not only as a focusing device but also as a super-resolution imaging device.
在过去十年中,人们为实现超越阿贝 - 瑞利衍射极限的成像分辨率做出了诸多努力。旨在突破这一极限的主要研究方向是利用包含物体紧邻区域电磁场分布精细细节的倏逝分量。在此,我们提出一种无需倏逝场的解决方案。以亚波长精度成像或受激发的物体无需紧邻超透镜或场集中器:可以设计一个光学掩模,它能产生被称为超振荡的波的相长干涉,当用单色波照射时,在倏逝场之外的视场中形成具有规定尺寸和形状的亚波长焦点。此外,我们证明这样的掩模不仅可以用作聚焦装置,还可以用作超分辨率成像装置。