Chai Jinan, Buriak Jillian M
National Institute for Nanotechnology, National Research Council, 11421 Saskatchewan Drive, Edmonton, Alberta, Canada T6G 2M9.
ACS Nano. 2008 Mar;2(3):489-501. doi: 10.1021/nn700341s.
Block copolymer thin films can be used as soft templates for a wide range of surfaces where large area patterns of nanoscale features are desired. The cylindrical domains of acid-sensitive, self-assembled monolayers of polystyrene-poly(2-vinylpyridine) block copolymers on silicon surfaces were utilized as structural elements for the production of parallel metal nanowires. Metal ion loading of the P2VP block with simple aqueous solutions of anionic metal complexes is accomplished via protonation of this basic block, rendering it cationic; electrostatic attraction leads to a high local concentration of metal complexes within the protonated P2VP domain. A subsequent brief plasma treatment simultaneously removes the polymer and produces metallic nanowires. The morphology of the patterns can modulated by controlling solution concentration, deposition time, and molecular weight of the block copolymers, as well as other factors. Horizontal metallic nanoarrays can be aligned on e-beam lithographically defined silicon substrates within different shapes, via graphoepitaxy. This method is highly versatile as the procedures to manipulate nanowire composition, dimension, spacing, and orientation are straightforward and based upon efficient aqueous inorganic chemistry.
嵌段共聚物薄膜可作为软模板用于各种需要大面积纳米级特征图案的表面。聚苯乙烯-聚（2-乙烯基吡啶）嵌段共聚物在硅表面的酸敏性自组装单层的圆柱形区域被用作生产平行金属纳米线的结构元件。通过用阴离子金属配合物的简单水溶液对P2VP嵌段进行金属离子负载，是通过该碱性嵌段的质子化来实现的，使其带阳离子；静电吸引导致质子化的P2VP域内金属配合物的局部高浓度。随后的短暂等离子体处理同时去除聚合物并产生金属纳米线。图案的形态可以通过控制溶液浓度、沉积时间、嵌段共聚物的分子量以及其他因素来调节。水平金属纳米阵列可以通过图形外延在电子束光刻定义的不同形状的硅基板上排列。这种方法具有高度的通用性，因为操纵纳米线组成、尺寸、间距和取向的程序很简单，并且基于高效的水性无机化学。
