Byun Youngchul, Ko Kyung Bo, Cho Moohyun, Namkung Won, Shin Dong Nam, Koh Dong Jun
School of Environmental Science and Engineering, Pohang University of Science and Technology, Hyoja Dong, Pohang, Kyoungbuk 790-784, Republic of Korea.
Chemosphere. 2009 May;75(6):815-8. doi: 10.1016/j.chemosphere.2009.01.040. Epub 2009 Feb 23.
Plasma-assisted selective non-catalytic reduction (SNCR) has been investigated to clarify which species generated by the plasma play a crucial role in NO reduction. We find that the presence of O(2) is indispensable and only H(2) is observed to be a stable product by dielectric barrier discharge (DBD) of NH(3). As the extent of NH(3) decomposition by DBD increases, the commencement temperature of SNCR processes is lowered and the working temperature window is widened. This propensity may be attributed to the chemical reaction of H(2) with O(2) to generate OH and H radicals which make it possible to yield NH(2) radicals even at low temperature.
为了弄清楚等离子体产生的哪些物种在NO还原中起关键作用，对等离子体辅助选择性非催化还原（SNCR）进行了研究。我们发现O(2)的存在是必不可少的，并且通过NH(3)的介质阻挡放电（DBD）仅观察到H(2)是一种稳定产物。随着DBD对NH(3)的分解程度增加，SNCR过程的起始温度降低，工作温度窗口变宽。这种倾向可能归因于H(2)与O(2)发生化学反应生成OH和H自由基，这使得即使在低温下也有可能产生NH(2)自由基。
