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[制备参数对ZnGa₂O₄长余辉发光的影响]

[Effects of preparation parameters on the long lasting luminescence of ZnGa2O4].

作者信息

Huang Shang-yong, Zhang Xi-qing, Huang Hai-qin, Yao Zhi-gang

机构信息

Key Laboratory of Luminescence and Optical Information, Ministry of Education, Institute of Optoelectronic Technology, Beijing Jiaotong University, Beijing 100044, China.

出版信息

Guang Pu Xue Yu Guang Pu Fen Xi. 2008 Dec;28(12):2777-80.

Abstract

Using high temperature solid state reaction method, ZnO and Ga2O3 with high purity as raw materials, different ZnGa2O4 samples were prepared at different molar ratios of raw materials and different temperatures. After excitation of the ZnGa2O4 samples by 254 nm UV lamps, obvious long lasting luminescence was detected for the first time, which showed two new long lasting luminescence peaks at 505 nm and 690 nm, respectively. And the relative intensity of the two peaks was effected by the preparation conditions such as molar ratio of the two raw materials and the sintering temperature. Less ZnO or higher temperature will strengthen the relative intensity of the 505 nm peak, while more ZnO or lower temperature will strengthen the relative intensity of the 690 nm peak. The origin of the two peaks was discussed based on some corresponding documents, and the conclusion is that the 505 nm peak comes from the 2E(A)-->4A2 transition of Ga3+ in a relatively distorted octahedral after some Zn2+ are substituted by Ga3+; and the 690 nm peak comes from the V0*--O2- transition after the singly charged ion oxygen vacancies appeare in the octahedral structure. The reasons why the preparing conditions can affect the relative peak intensity of the two peaks were also discussed. Less ZnO will cause Zn2O vacancies in the structure and more Ga3+ will occupy the Zn2+ positions, then will form distorted octahedral, and then the transition from energy level 2E(A) to (4)A2 of Ga3+ will cause the 505 nm peak to be dominant. On the other hand. too much ZnO will form oxygen vacancies, which will cause the 690 nm peak to be dominant. Higher temperature will cause more evaporation of ZnO and then relative less ZnO, and lower temperature will cause less evaporation of ZnO and then more oxygen vacancies. These conclusions are corresponding with the origin of the two peaks discussed before.

摘要

采用高温固相反应法,以高纯度的ZnO和Ga₂O₃为原料,在不同的原料摩尔比和不同温度下制备了不同的ZnGa₂O₄样品。用254nm紫外灯激发ZnGa₂O₄样品后,首次检测到明显的长余辉发光,分别在505nm和690nm处出现两个新的长余辉发光峰。并且这两个峰的相对强度受原料摩尔比和烧结温度等制备条件的影响。较少的ZnO或较高的温度会增强505nm峰的相对强度,而较多的ZnO或较低的温度会增强690nm峰的相对强度。基于一些相应文献对这两个峰的起源进行了讨论,结论是505nm峰来自于部分Zn²⁺被Ga³⁺取代后,处于相对扭曲八面体中的Ga³⁺的²E(A)-->⁴A₂跃迁;690nm峰来自于八面体结构中出现单电荷离子氧空位后的V₀*--O²⁻跃迁。还讨论了制备条件能够影响这两个峰相对峰强度的原因。较少的ZnO会导致结构中出现Zn₂O空位,更多的Ga³⁺会占据Zn²⁺位置,进而形成扭曲八面体,然后Ga³⁺从能级²E(A)到(4)A₂的跃迁会使505nm峰占主导。另一方面,过多的ZnO会形成氧空位,这会使690nm峰占主导。较高的温度会导致更多的ZnO蒸发,进而ZnO相对较少,而较低的温度会导致较少的ZnO蒸发,进而氧空位较多。这些结论与之前讨论的两个峰的起源相对应。

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