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通过时间分辨双光子光电子能谱研究硅中的超快载流子弛豫:谷内散射和热电子的能量弛豫

Ultrafast carrier relaxation in Si studied by time-resolved two-photon photoemission spectroscopy: intravalley scattering and energy relaxation of hot electrons.

作者信息

Ichibayashi T, Tanimura K

机构信息

The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan.

出版信息

Phys Rev Lett. 2009 Feb 27;102(8):087403. doi: 10.1103/PhysRevLett.102.087403. Epub 2009 Feb 26.

Abstract

The dynamical relaxations of photogenerated hot carriers in the X valley of Si have been studied using time-resolved two-photon photoemission spectroscopy. Intravalley scattering is completed within 100 fs to form a quasiequilibrated electron distribution near the conduction-band minimum, while maintaining about half the excess energy given to hot electrons. The energy relaxation follows the scattering with a 240-fs time constant that is independent of the excess energy.

摘要

利用时间分辨双光子光电子能谱研究了硅X谷中光生热载流子的动力学弛豫过程。谷内散射在100飞秒内完成,在导带最小值附近形成准平衡电子分布,同时保持给予热电子的多余能量的约一半。能量弛豫以240飞秒的时间常数随散射进行,该时间常数与多余能量无关。

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