Gan Yang, Franks George V
School of Chemical Engineering and Technology, Harbin Institute of Technology, Harbin, Heilongjiang 150001, China.
Ultramicroscopy. 2009 Jul;109(8):1061-5. doi: 10.1016/j.ultramic.2009.03.019. Epub 2009 Mar 19.
Contamination control of atomic force microscope (AFM) tips (including standard but supersharp imaging tips and particle/colloidal probes) is very important for reliable AFM imaging and surface/interface force measurements. Traditional cleaning methods such as plasma, UV-ozone and solvent treatments have their shortcomings. Here, we demonstrate that calibration gratings with supersharp spikes can be employed to scrub away contaminants accumulated on a colloidal sphere probe by scanning the probe against the spikes at high load at constant-force mode. The present method is superior to traditional cleaning methods in several aspects. First, accumulated lump-like organic/inorganic material can be removed; second, removal is non-destructive and highly efficient based on a "targeted removal" strategy; third, removal and probe shape/morphology study can be completed in a single step (we report, to our best knowledge, the first evidence of the wear of the colloidal sphere during force measurements); and fourth, both colloidal/particle probes and standard but supersharp AFM imaging tips can be treated.
原子力显微镜(AFM)探针(包括标准但超尖锐的成像探针以及颗粒/胶体探针)的污染控制对于可靠的AFM成像和表面/界面力测量非常重要。传统的清洁方法,如等离子体、紫外臭氧和溶剂处理,都有其缺点。在此,我们证明,通过在恒力模式下以高负载将探针扫描到超尖锐尖峰校准光栅上,可以擦除积累在胶体球探针上的污染物。本方法在几个方面优于传统清洁方法。首先,可以去除积累的块状有机/无机材料;其次,基于“靶向去除”策略,去除过程无损且高效;第三,去除和探针形状/形态研究可以在一步中完成(据我们所知,我们首次报道了在力测量过程中胶体球磨损的证据);第四,胶体/颗粒探针和标准但超尖锐的AFM成像探针都可以处理。