Ekinci Yasin, Solak Harun H, David Christian, Sigg Hans
Opt Express. 2006 Mar 20;14(6):2323-34. doi: 10.1364/oe.14.002323.
We have fabricated, characterized and theoretically analyzed the performance of bilayer (or stacked) metallic wire-grids. The samples with 100 nm period were fabricated with extreme-ultraviolet interference lithography. Transmission efficiency over 50% and extinction ratios higher than 40 dB were measured in the visible range with these devices. Simulations using a finite-difference time-domain algorithm are in agreement with the experimental results and show that the transmission spectra are governed by Fabry-Perot interference and nearfield coupling between the two layers of the structure. The simple fabrication method involves only a single lithographic step without any etching and guarantees precise alignment and separation of the two wire-grids with respect to each other.
我们已经制备、表征并从理论上分析了双层（或堆叠）金属线栅的性能。采用极紫外干涉光刻技术制备了周期为100 nm的样品。使用这些器件在可见光范围内测得的传输效率超过50%，消光比高于40 dB。使用时域有限差分算法进行的模拟与实验结果一致，表明传输光谱受法布里-珀罗干涉和结构两层之间的近场耦合支配。这种简单的制备方法仅涉及单个光刻步骤，无需任何蚀刻，并保证了两个线栅彼此之间的精确对准和分离。
