Chakraborty Biswanath, Das Anindya, Sood A K
Department of Physics, Indian Institute of Science, Bangalore 560012, India.
Nanotechnology. 2009 Sep 9;20(36):365203. doi: 10.1088/0957-4484/20/36/365203. Epub 2009 Aug 18.
We show simultaneous p- and n-type carrier injection in a bilayer graphene channel by varying the longitudinal bias across the channel and the top-gate voltage. The top gate is applied electrochemically using solid polymer electrolyte and the gate capacitance is measured to be 1.5 microF cm(-2), a value about 125 times higher than the conventional SiO(2) back-gate capacitance. Unlike the single-layer graphene, the drain-source current does not saturate on varying the drain-source bias voltage. The energy gap opened between the valence and conduction bands using top- and back-gate geometry is estimated.
通过改变沟道上的纵向偏置和顶栅电压,我们在双层石墨烯沟道中实现了同时的p型和n型载流子注入。顶栅采用固体聚合物电解质进行电化学施加,测得的栅电容为1.5微法/平方厘米,该值比传统的SiO₂背栅电容高约125倍。与单层石墨烯不同,漏源电流在改变漏源偏置电压时不会饱和。利用顶栅和背栅结构估算了价带和导带之间打开的能隙。