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在扫描电子显微镜内对单个钴纳米线进行原位拉伸测试。

In situ tensile testing of individual Co nanowires inside a scanning electron microscope.

作者信息

Zhang Dongfeng, Breguet Jean-Marc, Clavel Reymond, Phillippe Laetitia, Utke Ivo, Michler Johann

机构信息

Laboratory of Robotic Systems, Ecole Polytechnique Fédérale de Lausanne, Station 9, CH-1015 Lausanne, Switzerland.

出版信息

Nanotechnology. 2009 Sep 9;20(36):365706. doi: 10.1088/0957-4484/20/36/365706. Epub 2009 Aug 18.

DOI:10.1088/0957-4484/20/36/365706
PMID:19687546
Abstract

Uniaxial quasi-static tensile testing on individual nanocrystalline Co nanowires (NWs), synthesized by electrochemical deposition process (EDP) in porous templates, was performed inside a scanning electron microscope (SEM) using a microfabricated tensile stage consisting of a comb drive actuator and a clamped-clamped beam force sensor. A 'three-beam structure' was fabricated by focused ion beam induced deposition (FIBID) on the stage, from which the specimen elongation and the tensile force could be measured simultaneously from SEM images at high magnification. A novel strategy of modifying device topography, e.g. in the form of trenches and pillars, was proposed to facilitate in situ SEM pick-and-place nanomanipulation, which could achieve a high yield of about 80% and reduce the difficulties in specimen preparation for tensile testing at the nanoscale. The measured apparent Young's modulus (75.3 +/- 14.6) GPa and tensile strength (1.6 +/- 0.4) GPa are significantly lower than the bulk modulus and the theoretical strength of monocrystalline samples, respectively. This result is important for designing Co NW-based devices. The origins of these distinctions are discussed in terms of the stiffnesses of the soldering portions, specimen misalignment, microstructure of the NWs and the experimental measurement uncertainty.

摘要

在扫描电子显微镜(SEM)内,使用由梳齿驱动致动器和夹支梁力传感器组成的微加工拉伸台,对通过电化学沉积工艺(EDP)在多孔模板中合成的单个纳米晶钴纳米线(NWs)进行了单轴准静态拉伸测试。通过聚焦离子束诱导沉积(FIBID)在该平台上制造了一种“三梁结构”,在高倍SEM图像中可同时测量该结构中试样的伸长量和拉力。提出了一种修改器件形貌的新策略,例如采用沟槽和柱体的形式,以促进原位SEM拾取和放置纳米操作,该操作可实现约80%的高产率,并减少纳米尺度拉伸测试中试样制备的难度。测得的表观杨氏模量为(75.3±14.6)GPa,抗拉强度为(1.6±0.4)GPa,分别显著低于单晶样品的体模量和理论强度。该结果对于设计基于钴纳米线的器件具有重要意义。从焊接部分的刚度、试样未对准、纳米线的微观结构以及实验测量不确定性等方面讨论了这些差异的根源。

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