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缺陷诱导的氮氧化物在(10,0)单壁碳纳米管上的化学吸附:密度泛函计算的见解。

Defect-induced chemisorption of nitrogen oxides on (10,0) single-walled carbon nanotubes: Insights from density functional calculations.

机构信息

Department of Chemistry and State Key Laboratory of Physical Chemistry of Solid Surfaces, College of Chemistry and Chemical Engineering, Xiamen University, Xiamen 361005, China.

出版信息

J Chem Phys. 2009 Sep 21;131(11):114706. doi: 10.1063/1.3226572.

Abstract

The interactions of NO(x) (x=1,2,3) with the defective semiconducting (10,0) carbon nanotubes were studied by the density functional theory. Optimized geometries, binding energies, and electronic structures of the NO(x)-adsorbed nanotubes were determined on the basis of calculations. Effects of the defect density and the electric field on the binding energy and charge transfer have been investigated. In sharp contrast with the case of perfect nanotube, the adsorption of NO(x) at the defect site of (10,0) tube is generally chemical, and after the chemisorption of one NO(2) or one NO(3) the carbon nanotubes with various defects behave as conductors, while the consecutive adsorption of the second NO(2) or the second NO(3) makes these tubes become semiconductors again. Calculations show that the NO(2) adsorption at a topological defect is a barrier-free process, while the NO(3) adsorption experiences a barrier due to transition of the pi<-->s electronic configuration of the NO(3) moiety.

摘要

采用密度泛函理论研究了 NO(x)(x=1,2,3)与缺陷型半导体(10,0)碳纳米管的相互作用。基于计算结果确定了 NO(x)吸附纳米管的优化几何形状、结合能和电子结构。研究了缺陷密度和电场对结合能和电荷转移的影响。与完美纳米管的情况形成鲜明对比的是,NO(x)在(10,0)管缺陷位的吸附通常是化学吸附,在一个 NO(2)或一个 NO(3)吸附后,具有各种缺陷的碳纳米管表现为导体,而第二个 NO(2)或第二个 NO(3)的连续吸附又使这些管重新变为半导体。计算表明,拓扑缺陷处的 NO(2)吸附是无势垒过程,而由于 NO(3)部分的 pi<-->s 电子构型的转变,NO(3)吸附经历了势垒。

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