Lin Chenxi, Povinelli Michelle L
Ming Hsieh Department of Electrical Engineering, University of Southern California, Los Angeles, CA 90089, USA.
Opt Express. 2009 Oct 26;17(22):19371-81. doi: 10.1364/OE.17.019371.
In this paper, we use the transfer matrix method to calculate the optical absorptance of vertically-aligned silicon nanowire (SiNW) arrays. For fixed filling ratio, significant optical absorption enhancement occurs when the lattice constant is increased from 100 nm to 600 nm. The enhancement arises from an increase in field concentration within the nanowire as well as excitation of guided resonance modes. We quantify the absorption enhancement in terms of ultimate efficiency. Results show that an optimized SiNW array with lattice constant of 600 nm and wire diameter of 540 nm has a 72.4% higher ultimate efficiency than a Si thin film of equal thickness. The enhancement effect can be maintained over a large range of incidence angles.
在本文中,我们使用转移矩阵方法来计算垂直排列的硅纳米线(SiNW)阵列的光吸收率。对于固定的填充率,当晶格常数从100纳米增加到600纳米时,会出现显著的光吸收增强。这种增强源于纳米线内场强的增加以及导模共振模式的激发。我们根据极限效率对吸收增强进行了量化。结果表明,晶格常数为600纳米、线直径为540纳米的优化SiNW阵列的极限效率比同等厚度的硅薄膜高72.4%。这种增强效应可以在很大的入射角范围内保持。