聚二甲基硅氧烷的真空紫外光刻图形化。

Fabrication of cell pattern on poly(dimethylsiloxane) by vacuum ultraviolet lithography.

机构信息

State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan, China.

出版信息

Colloids Surf B Biointerfaces. 2010 Mar 1;76(1):381-5. doi: 10.1016/j.colsurfb.2009.11.013. Epub 2009 Nov 20.

DOI:10.1016/j.colsurfb.2009.11.013

PMID:20005082

Abstract

Cell patterning on substrates has played a significant role in the study of basic biology, cell-based biosensor and tissue engineering. In this report, a cell pattern was prepared on poly(dimethylsiloxane) (PDMS) substrate by vacuum ultraviolet (VUV) lithography. After immobilizing allyl-polyethylene glycol (APEG) onto PDMS, a chemical heterogeneous patterned surface was fabricated by VUV (Xe(2) excimer: 172nm) lithography with copper mesh as a photomask. The UV exposed domains can promote L929 cell adhesion and growth. However, non-exposed regions resist cell attachment because of the repelling property of PEG. Therefore, cell pattern could be achieved without pre-adsorption of cell adhesive species before cell culture.

摘要

基底的细胞图案化在基础生物学、基于细胞的生物传感器和组织工程学的研究中发挥了重要作用。在本报告中，通过真空紫外（VUV）光刻在聚二甲基硅氧烷（PDMS）基底上制备了细胞图案。在将烯丙基聚乙二醇（APEG）固定到 PDMS 上之后，通过 VUV（Xe(2)准分子：172nm）光刻并用铜网作为掩模来制造化学异质图案化表面。UV 曝光区域可以促进 L929 细胞的黏附和生长。然而，由于 PEG 的排斥特性，非曝光区域抵抗细胞附着。因此，在细胞培养之前无需预先吸附细胞黏附物质即可实现细胞图案化。