Graduate School of Science and Engineering for Research, University of Toyama, 3190 Gofuku, Toyama 930-8555, Toyama, Japan.
J Hazard Mater. 2010 Apr 15;176(1-3):973-8. doi: 10.1016/j.jhazmat.2009.11.136. Epub 2009 Dec 1.
In this paper, various zinc oxide (ZnO) films are deposited by a versatile and effective dc-reactive facing-target sputtering method. The ratios of Ar to O(2) in the mixture gas are varied from 8:2 to 6:4 at a fixed sputtering pressure of 1.0 Pa. X-ray diffraction, spectrophotometer and scanning electron microscope are used to study the crystal structure, optical property and surface morphology of the as-deposited films. The Pt ultra-thin layer, approximately 2 nm thick, is deposited on the surface of ZnO film by dc diode sputtering with a mesh mask controlling the coated area. The photocatalytic activity of ZnO films and Pt-ZnO films is evaluated by decomposition of methanol under UV-vis light irradiation. The variation of photocatalytic activity depends on the ratios of Ar to O(2), which is mainly attributed to the different grain size and carrier mobility. Though the pure ZnO film normally shows a low gas-phase photocatalytic activity, its activity is significantly enhanced by depositing Pt ultra-thin layer.
本文采用通用且有效的直流反应磁控溅射法制备了各种氧化锌（ZnO）薄膜。在固定的溅射压力为 1.0 Pa 下，混合气体中 Ar 与 O(2)的比例从 8:2 变化到 6:4。使用 X 射线衍射仪、分光光度计和扫描电子显微镜研究了沉积薄膜的晶体结构、光学性质和表面形貌。通过直流二极管溅射在 ZnO 薄膜表面沉积约 2nm 厚的 Pt 超薄层，采用网孔掩模控制涂层面积。通过在紫外可见光照射下分解甲醇来评估 ZnO 薄膜和 Pt-ZnO 薄膜的光催化活性。光催化活性的变化取决于 Ar 与 O(2)的比例，这主要归因于不同的晶粒尺寸和载流子迁移率。尽管纯 ZnO 薄膜通常表现出较低的气相光催化活性，但通过沉积 Pt 超薄层，其活性得到显著提高。
