Department of Chemistry, University of Sheffield, Sheffield S3 7HF, UK.
Langmuir. 2010 Mar 16;26(6):4449-58. doi: 10.1021/la9035024.
The synthesis of alpha-thioacetate terminated quaterthiophene and phenylene-thiophene materials, possessing thioacetate, oxetane, and alkyl groups at their omega-termini, is described. After deprotection these molecules were adsorbed onto Au films and the resulting self-assembled monolayers were characterized by X-ray photoelectron spectroscopy (XPS) and friction force microscopy (FFM). FFM indicated that monolayers formed by the dithioacetates had the highest coefficients of friction, followed by the oxetane-terminated adsorbates, with the alkyl-functionalized materials showing the lowest friction coefficients. These data may be understood in terms of differences in molecular packing. The quaterthiophene adsorbates also yielded higher friction coefficients than their phenylene-thiophene counterparts. Micrometer-scale patterns were fabricated by mask-based exposure to 244 nm light, and characterized by FFM. Nanometer-scale patterns were fabricated using near-field exposure and characterized by FFM. The images obtained demonstrated that features of conjugated oligomers with high spatial resolution (59 nm, ca. lambda/4) were achievable.
描述了具有硫乙酸酯、氧杂环丁烷和末端烷基的α-硫乙酸酯封端的四噻吩和苯并噻吩材料的合成。脱保护后，这些分子被吸附到 Au 膜上，所得自组装单层通过 X 射线光电子能谱（XPS）和摩擦力显微镜（FFM）进行了表征。FFM 表明，由二硫代乙酸酯形成的单层具有最高的摩擦系数，其次是氧杂环丁烷封端的吸附剂，而烷基官能化材料的摩擦系数最低。这些数据可以根据分子堆积的差异来理解。四噻吩吸附剂的摩擦系数也高于其苯并噻吩对应物。通过基于掩模的 244nm 光曝光制造了微米级图案，并通过 FFM 进行了表征。使用近场曝光制造了纳米级图案，并通过 FFM 进行了表征。获得的图像表明，可以实现具有高空间分辨率（59nm，约为 lambda/4）的共轭寡聚物的特征。
