Klein L
Warner & Swasey Company, Control Instrument Division, Flushing, New York 11354, USA.
Appl Opt. 1968 Apr 1;7(4):677-85. doi: 10.1364/AO.7.000677.
Concurrently with emission measurements of a high pressure xenon arc in the spectral range 3000 A to 2 micro, its absorption in the ir was measured by a technique based on modulating the less intense radiation of a carbon arc used as background source. The emission measurements were repeated with a rapid scanning spectrometer while flashing the xenon arc for 0.1 see at 10 kW, which is five times the normal power input. The arc showed excellent stability and reproducibility both in the stationary and the flashed modes. The intensity increase of the continuum was proportional to the increase of power input during the flash. A simple expression was derived connecting the spectral radiance of the continuum directly with the temperature and pressure of the arc. The temperature profile of the xenon arc was obtained using this expression and also by applying the Planck-Kirchhoff method to the Abel inverted emission and absorption of an ir xenon line. Both approaches show fair agreement at the arc center. The wavelength dependence of the correction factor for departures from hydrogenic behavior of the xenon continuum was derived from the measured spectral radiances and compared with theoretical calculations.
在对高压氙弧在3000埃至2微米光谱范围内的发射进行测量的同时，通过一种基于调制用作背景源的碳弧较弱辐射的技术来测量其红外吸收。使用快速扫描光谱仪在以10千瓦对氙弧进行0.1秒闪光的情况下重复发射测量，该功率是正常输入功率的五倍。该电弧在稳定模式和闪光模式下均表现出出色的稳定性和再现性。连续谱强度的增加与闪光期间功率输入的增加成正比。推导了一个简单的表达式，将连续谱的光谱辐射率直接与电弧的温度和压力联系起来。使用该表达式并通过将普朗克 - 基尔霍夫方法应用于红外氙线的阿贝尔反演发射和吸收来获得氙弧的温度分布。两种方法在电弧中心显示出相当一致的结果。从测量的光谱辐射率中得出了氙连续谱偏离类氢行为的校正因子的波长依赖性，并与理论计算进行了比较。
