Tarasevich M
Appl Opt. 1970 Jan 1;9(1):173-6. doi: 10.1364/AO.9.000173.
Rough ground samples of fused silica were irradiated with an argon ion beam. At high angles of incidence the randomly pitted surface structure was converted to a striated surface. An explanation for the development of the striated topography is based on the dependence of sputtering rate on the localized angle of incidence of the ions with respect to individual surface features. Experimental conditions for removal of isolated surface defects and the conditions under which a smooth surface may be produced by ion erosion are discussed.
用氩离子束辐照熔融石英的粗糙表面样品。在高入射角下,随机麻点表面结构转变为条纹状表面。条纹形貌形成的一种解释基于溅射速率对离子相对于单个表面特征的局部入射角的依赖性。讨论了去除孤立表面缺陷的实验条件以及通过离子蚀刻产生光滑表面的条件。