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镧系元素 N,N-二甲基氨基二硼酸盐:含镧系元素薄膜沉积的高挥发性前体。

Lanthanide N,N-dimethylaminodiboranates: highly volatile precursors for the deposition of lanthanide-containing thin films.

机构信息

The School of Chemical Sciences, University of Illinois at Urbana-Champaign, 600 South Mathews Avenue, Urbana, Illinois 61801, USA.

出版信息

J Am Chem Soc. 2010 Feb 24;132(7):2106-7. doi: 10.1021/ja9098005.

Abstract

New lanthanide CVD precursors of stoichiometry Ln(H(3)BNMe(2)BH(3))(3) have been prepared, where Ln = La, Ce, Pr, Nd, Sm, Gd, Tb, Dy, Ho, Er, Tm, and Lu. The ligand is N,N-dimethylaminodiboranate, a new kind of multidentate borohydride. The structures of the Ln(H(3)BNMe(2)BH(3))(3) complexes are highly dependent on the size of the lanthanide ions: the coordination number decreases from Pr (CN = 14) to Sm (CN = 13) to Er (CN = 12) corresponding with the decrease in ionic radii. The Ln(H(3)BNMe(2)BH(3))(3) complexes are highly volatile and sublime at temperatures as low as 65 degrees C in vacuum. These complexes are useful CVD precursors; for example, Y(H(3)BNMe(2)BH(3))(3) has been used to deposit Y(2)O(3) on silicon at 300 degrees C by CVD using water as a coreactant.

摘要

已经制备了化学计量比 Ln(H(3)BNMe(2)BH(3))(3)的新型镧系元素 CVD 前体,其中 Ln = La、Ce、Pr、Nd、Sm、Gd、Tb、Dy、Ho、Er、Tm 和 Lu。配体是 N,N-二甲基氨基二硼酸盐,一种新型的多齿硼氢化物。Ln(H(3)BNMe(2)BH(3))(3)配合物的结构高度依赖于镧系元素离子的大小:从 Pr(CN = 14)到 Sm(CN = 13)再到 Er(CN = 12),配位数逐渐减少,这与离子半径的减小相对应。Ln(H(3)BNMe(2)BH(3))(3)配合物在真空中的温度低至 65°C 时就具有很高的挥发性和升华性。这些配合物是有用的 CVD 前体;例如,Y(H(3)BNMe(2)BH(3))(3)已被用于通过 CVD 使用水作为反应物在 300°C 下在硅上沉积 Y(2)O(3)。

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