Garcia E, Stark H, Barker R C
Appl Opt. 1972 Jul 1;11(7):1480-90. doi: 10.1364/AO.11.001480.
A procedure for measuring the point-to-point local variance of a spatial random scene is discussed. The relations that are required between the second-order statistics of the random process and the parameters of the optical configuration to furnish accurate and stable variance estimates are established. The procedure is experimentally verified by using calibrated samples of the random checkerboard and the overlapping circular grain models. A modification of the procedure enables the generation of spatial masks that are useful in automatic image processing. The spatial masks are used as binary spatial gates to isolate certain classes of objects within a scene and reject all others. Typical masks are synthesized and their applications illustrated.
讨论了一种测量空间随机场景逐点局部方差的方法。建立了随机过程的二阶统计量与光学配置参数之间所需的关系，以提供准确和稳定的方差估计。通过使用随机棋盘和重叠圆形颗粒模型的校准样本对该方法进行了实验验证。对该方法的一种修改能够生成在自动图像处理中有用的空间掩膜。这些空间掩膜用作二进制空间门，以隔离场景中的某些类别的对象并排除所有其他对象。合成了典型的掩膜并说明了它们的应用。
