Department of Psychology, Graduate School of Letters, Kyoto University, Yoshida-Honmachi, Sakyo, Kyoto 606-8501, Japan.
J Exp Psychol Hum Percept Perform. 2010 Feb;36(1):25-37. doi: 10.1037/a0017165.
A sparse mask that persists beyond the duration of a target can reduce its visibility, a phenomenon called object substitution masking. Y. Jiang and M. M. Chun (2001a) found an asymmetric pattern of substitution masking such that a mask on the peripheral side of the target caused stronger substitution masking than on the central side. Assuming spatial attention was focused toward the target, the peripheral and central masks were located in the same and opposite direction of an attentional path with reference to the target in their study. We hypothesized that this asymmetric mask configuration relative to the attentional shift contributes to asymmetric substitution masking. To test this hypothesis, we conducted four experiments among which the presence or absence of the center-periphery relationship and the presence or absence of the asymmetric mask configuration were manipulated independently and orthogonally. The results suggest that asymmetric substitution masking occurs relative to the direction of spatial attention irrespective of the central-peripheral relation. We propose that the asymmetry in substitution masking might be explained by attentional momentum associated with orienting toward the target.
一个持续时间超过目标的稀疏掩蔽可以降低其可见度，这种现象称为目标替代掩蔽。Y. Jiang 和 M. M. Chun（2001a）发现了一种不对称的替代掩蔽模式，即目标外围的掩蔽比中心的掩蔽更强。假设空间注意力集中在目标上，那么在他们的研究中，相对于目标，外周和中央掩蔽处于相同的和相反的注意力路径方向上。我们假设相对于注意力转移的这种不对称掩蔽配置有助于不对称的替代掩蔽。为了验证这一假设，我们进行了四项实验，其中独立和正交地操纵了中心-外围关系的存在与否以及不对称掩蔽配置的存在与否。结果表明，相对于空间注意力的方向，会出现不对称的替代掩蔽，而与中心-外围关系无关。我们提出，替代掩蔽的不对称性可能可以通过与朝向目标的定向相关的注意力动量来解释。
