Department of Chemistry, University of Waterloo, 200 University Avenue West, Waterloo, Ontario N2L 3G1, Canada.
Anal Chem. 2010 Mar 1;82(5):1779-85. doi: 10.1021/ac902383w.
Cyclic biamperometry has been investigated as a method for the quantitation of one form of a reversibly electroactive redox couple in the presence of the other form, using the ferri-ferrocyanide couple in aqueous KCl. A triangular voltage waveform applied across two equal-area, planar gold electrodes yields peak currents that depend on the square root of the applied voltage scan rate, when one form of the redox couple is present in excess. Independent measurement of electrode-to-solution potential during biamperometric scans allowed estimation of the fractional impedance at each electrode-solution interface, and these values allow calculation of the effective potential scan rates at each electrode. Results show that when one form is present in a 5-fold excess or greater, the potential scan rate for the limiting reaction is nearly identical to the applied voltage scan rate. Similar values were obtained from impedance calculations, but discrepancies between the predicted and experimental values are evident when the two forms are present at near equivalent concentrations. When one form of the redox couple is present in excess, cyclic biamperometric peak currents depend linearly on the concentration of the limiting form, and these currents can be amplified by using cells with one electrode much larger than the other. Because this method does not require a reference electrode, it can, in principle, be readily incorporated into new electrochemical array or lab-on-a-chip devices.
循环双安培法已被研究用于在存在另一种形式的情况下定量一种可逆电活性氧化还原对,使用在水性 KCl 中的铁氰化亚铁电对。当一种氧化还原对形式过量存在时,施加在两个相等面积的平面金电极上的三角形电压波形会产生依赖于施加电压扫描速率的平方根的峰电流。在双安培扫描期间独立测量电极-溶液电势允许估计每个电极-溶液界面的分数阻抗,并且这些值允许计算每个电极的有效电势扫描速率。结果表明,当一种形式存在 5 倍或更多的过量时,限制反应的电势扫描速率几乎与施加的电压扫描速率相同。从阻抗计算中获得了相似的值,但当两种形式接近等效浓度时,预测值和实验值之间存在明显差异。当氧化还原对的一种形式过量存在时,循环双安培峰电流线性依赖于限制形式的浓度,并且可以通过使用一个电极比另一个电极大得多的电池来放大这些电流。由于该方法不需要参比电极,因此原则上可以很容易地将其纳入新的电化学阵列或片上实验室设备中。