IMN, Universite de Nantes, CNRS, 2 Rue de la Houssiniere, BP32229, 44322 Nantes, France.
ACS Nano. 2010 Mar 23;4(3):1680-6. doi: 10.1021/nn9015955.
X-ray photoelectron spectroscopy at 3.5 keV photon energy, in combination with high-resolution transmission electron microscopy, is used to follow the formation of the interface between rhodium and carbon nanotubes. Rh nucleates at defect sites, whether initially present or induced by oxygen-plasma treatment. More uniform Rh cluster dispersion is observed on plasma-treated CNTs. Experimental results are compared to DFT calculations of small Rh clusters on pristine and defective graphene. While Rh interacts as strongly with the carbon as Ti, it is less sensitive to the presence of oxygen, suggesting it as a good candidate for nanotube contacts.
采用 3.5keV 光子能量的 X 射线光电子能谱结合高分辨率透射电子显微镜，用于跟踪铑与碳纳米管之间界面的形成。铑在缺陷部位成核，无论这些缺陷是初始存在的还是由氧等离子体处理诱导产生的。在经过等离子体处理的 CNT 上观察到 Rh 团簇分散得更加均匀。实验结果与小尺寸 Rh 团簇在原始和有缺陷的石墨烯上的 DFT 计算进行了比较。虽然 Rh 与碳的相互作用与 Ti 一样强，但它对氧的存在不那么敏感，这表明它是一种很好的纳米管接触材料的候选者。
