Mollenauer L F, Tomlinson W J
Appl Opt. 1977 Mar 1;16(3):555-7. doi: 10.1364/AO.16.000555.
A simple interferometer and associated technique, allowing for sequential exposure of small segments in the writing of a large grating, is described. The increased intensity thus afforded greatly aids in overcoming nonlinear and reciprocity effects in the recording medium. Furthermore, the technique eliminates the need for a large collimator and errors introduced by imperfect collimation. Demonstration gratings written with this technique have shown maximum registration errors of +/-35 nm.
本文描述了一种简单的干涉仪及相关技术，该技术允许在写入大光栅时对小片段进行顺序曝光。由此产生的强度增加极大地有助于克服记录介质中的非线性和互易效应。此外，该技术无需大型准直仪，也消除了因准直不完善而引入的误差。用这种技术写入的演示光栅显示出的最大对准误差为±35纳米。
