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本文引用的文献

1
Spore photoproduct lyase catalyzes specific repair of the 5R but not the 5S spore photoproduct.孢子光产物裂合酶催化5R而非5S孢子光产物的特异性修复。
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Vitamin B(12) and alpha-Ribonucleosides.维生素B12与α-核糖核苷
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The Radical SAM Superfamily.自由基S-腺苷甲硫氨酸超家族
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Thymine Photoproducts but not Thymine Dimers Found in Ultraviolet-Irradiated Bacterial Spores.在紫外辐射的细菌孢子中发现胸腺嘧啶光产物而不是胸腺嘧啶二聚体。
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Chemoselective deprotection of alpha-indole and imidazole ribonucleosides.α-吲哚和咪唑核糖核苷的化学选择性脱保护
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6
A new, simple, and selective palladium-catalyzed cleavage of triethylsilyl ethers.一种新型、简单且具有选择性的钯催化三乙基硅基醚的裂解反应。
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7
Facile cleavage of triethylsilyl (TES) ethers using o-iodoxybenzoic acid (IBX) without affecting tert-butyldimethylsilyl (TBS) ethers.使用间碘酰基苯甲酸(IBX)可轻松裂解三乙基硅基(TES)醚,且不影响叔丁基二甲基硅基(TBS)醚。
Org Lett. 2002 Jun 27;4(13):2141-4. doi: 10.1021/ol025946n.
8
Direct H atom abstraction from spore photoproduct C-6 initiates DNA repair in the reaction catalyzed by spore photoproduct lyase: evidence for a reversibly generated adenosyl radical intermediate.由芽孢光产物裂解酶催化的反应中,从芽孢光产物C-6直接夺取氢原子启动DNA修复:关于可逆生成的腺苷自由基中间体的证据。
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Adenosylmethionine-dependent iron-sulfur enzymes: versatile clusters in a radical new role.依赖腺苷甲硫氨酸的铁硫酶:具有全新作用的多功能簇
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10
I will survive: protecting and repairing spore DNA.我将存活:保护和修复孢子DNA。
J Bacteriol. 1992 May;174(9):2737-41. doi: 10.1128/jb.174.9.2737-2741.1992.

三乙基硅基醚的化学选择性脱保护

Chemoselective deprotection of triethylsilyl ethers.

作者信息

Chandra Tilak, Broderick William E, Broderick Joan B

机构信息

Department of Chemistry and Biochemistry Montana State University, Bozeman, MT 59717, USA.

出版信息

Nucleosides Nucleotides Nucleic Acids. 2009 Nov;28(11):1016-29. doi: 10.1080/15257770903362172.

DOI:10.1080/15257770903362172
PMID:20183570
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC2829734/
Abstract

An efficient and selective method was developed for the deprotection of triethylsilyl (TES) ethers using formic acid in methanol (5-10%) or in methylene chloride 2-5%) with excellent yields. TES ethers are selectively deprotected to the corresponding alcohols in high yields using formic acid in methanol under mild reaction conditions. Other hydroxyl protecting groups like t-butyldimethylsilyl (TBDMS) remain unaffected.

摘要

开发了一种高效且选择性的方法,用于使用甲醇(5 - 10%)或二氯甲烷(2 - 5%)中的甲酸对三乙基硅基(TES)醚进行脱保护,产率优异。在温和的反应条件下,使用甲醇中的甲酸可将TES醚选择性地高产率脱保护为相应的醇。其他羟基保护基团如叔丁基二甲基硅基(TBDMS)不受影响。