Vizir A V, Oks E M, Yushkov G Yu
High Current Electronics Institute, Siberian Division of the Russian Academy Sciences, Tomsk 634055, Russia.
Rev Sci Instrum. 2010 Feb;81(2):02B304. doi: 10.1063/1.3258032.
We have designed, made, and demonstrated a broad-beam, dc, ion source based on a two-stage, hollow-cathode, and glow discharges plasma. The first-stage discharge (auxiliary discharge) produces electrons that are injected into the cathode cavity of a second-stage discharge (main discharge). The electron injection causes a decrease in the required operating pressure of the main discharge down to 0.05 mTorr and a decrease in required operating voltage down to about 50 V. The decrease in operating voltage of the main discharge leads to a decrease in the fraction of impurity ions in the ion beam extracted from the main gas discharge plasma to less than 0.2%. Another feature of the source is a single-grid accelerating system in which the ion accelerating voltage is applied between the plasma itself and the grid electrode. The source has produced steady-state Ar, O, and N ion beams of about 14 cm diameter and current of more than 2 A at an accelerating voltage of up to 2 kV.
我们设计、制造并展示了一种基于两级空心阴极辉光放电等离子体的宽束直流离子源。第一级放电(辅助放电)产生电子,这些电子被注入到第二级放电(主放电)的阴极腔中。电子注入使得主放电所需的工作压力降至0.05毫托,并使所需的工作电压降至约50伏。主放电工作电压的降低导致从主气体放电等离子体中提取的离子束中杂质离子的比例降至小于0.2%。该离子源的另一个特点是单栅加速系统,其中离子加速电压施加在等离子体本身和栅极电极之间。该离子源在高达2千伏的加速电压下产生了直径约14厘米、电流超过2安的稳态氩离子束、氧离子束和氮离子束。