柯达649F感光板在514.5纳米处的间歇特性曲线。

Intermittent characteristic curves for Kodak 649F plates at 514.5 nm.

作者信息

Couture J J, Lessard R A

出版信息

Appl Opt. 1979 Nov 1;18(21):3644. doi: 10.1364/AO.18.003644.

DOI:10.1364/AO.18.003644

PMID:20216664

Abstract

In a systematic study of sensitometric plate response for Kodak 649F, we have obtained various characteristic curves for intermittent exposures of laser light at 514.5 nm. Two different methods were used during the recording of specular exposures. We deduced typical values of the photographic parameters associated with these curves, many of which (T(A) - E; T(A) - logE; D - logE) are presented. The reciprocity law failure effects associated with many curves are discussed.

摘要

在对柯达649F感光板响应的系统研究中，我们获得了514.5nm激光间歇曝光的各种特性曲线。在记录镜面曝光时使用了两种不同的方法。我们推导了与这些曲线相关的摄影参数的典型值，其中许多值（T(A)-E；T(A)-logE；D-logE）都有列出。还讨论了与许多曲线相关的互易律失效效应。