Kleinknecht H P, Meier H
Appl Opt. 1980 Feb 15;19(4):525-33. doi: 10.1364/AO.19.000525.
Test patterns in the form of diffraction gratings are used for testing and monitoring linewidths on integrated circuit structures. The first and second diffraction orders produed by a laser beam are evaluated to give the width of the grating lines. Measurements on chrome masks show that this technique is accurate to 5% down to linewidths of 0.5 microm. The design of a test set for factory type mask testing is presented. Also, experiments are reported on the testing of patterns on Si wafers directly after. photoresist development and after various etching steps, and an-automatic setup for rapid testing of wafers is described.
以衍射光栅形式的测试图案用于测试和监测集成电路结构上的线宽。对激光束产生的一级和二级衍射级进行评估，以得出光栅线的宽度。对铬掩膜的测量表明，该技术在低至0.5微米的线宽下精度可达5%。本文介绍了一种用于工厂型掩膜测试的测试装置的设计。此外，还报告了在光刻胶显影后以及各种蚀刻步骤后直接对硅片上的图案进行测试的实验，并描述了一种用于快速测试硅片的自动装置。
