Slettemoen G A
Appl Opt. 1980 Feb 15;19(4):616-23. doi: 10.1364/AO.19.000616.
A new electronic speckle pattern interferometric (ESPI) technique is introduced. The technique is based on a reference beam combined with a large aperture optical system. The basic principles are described and compared with conventional ESPI setups. The new interferometer is easy to adjust, it is invulnerable to dust and scratches on the optical components, and is very compact. It is well-suited for practical engineering applications. Light sensitivity and fringe quality are comparable with the conventional ESPI features. Superior fringe pattern can be obtained by use of a new speckle reduction technique to be described.
介绍了一种新的电子散斑干涉测量（ESPI）技术。该技术基于参考光束与大孔径光学系统相结合。描述了其基本原理并与传统的ESPI装置进行了比较。这种新型干涉仪易于调节，对光学元件上的灰尘和划痕不敏感，并且非常紧凑。它非常适合实际工程应用。其光灵敏度和条纹质量与传统ESPI特性相当。通过使用一种即将描述的新的散斑减少技术，可以获得更好的条纹图案。
