Instituto de Microelectrónica de Madrid: CSIC, Isaac Newton 8, Tres Cantos, Madrid, Spain.
Ultramicroscopy. 2010 May;110(6):729-32. doi: 10.1016/j.ultramic.2010.02.040. Epub 2010 Feb 24.
Sequential and parallel local oxidation nanolithographies have been applied to pattern pentacene samples by creating a variety of nanostructures. The sequential local oxidation process is performed with an atomic force microscope and requires the application of a sequence of voltage pulses of 36V for 1ms. The parallel local oxidation process is performed by using a conductive and patterned stamp. Then, a voltage pulse is applied between the stamp and the pentacene surface. Patterns formed by arrays of parallel lines covering 1mm(2) regions and with a periodicity of less than 1microm have been generated in a few seconds. We also show that the patterns can be used as templates for the deposition of antibodies.
顺序和并行局部氧化纳米光刻技术已被应用于通过创建各种纳米结构对并五苯样品进行图案化。顺序局部氧化过程是使用原子力显微镜进行的,需要施加一系列 36V 的电压脉冲持续 1ms。并行局部氧化过程是通过使用导电且图案化的压印模板来完成的。然后,在压印模板和并五苯表面之间施加电压脉冲。在几秒钟内,在覆盖 1mm(2)区域的平行线阵列中形成了具有小于 1 微米的周期性的图案。我们还表明,这些图案可以用作沉积抗体的模板。