聚甲基丙烯酸甲酯聚合物的原子力显微镜纳米光刻技术。

Atomic force microscope nanolithography of polymethylmethacrylate polymer.

作者信息

Teixeira F S, Mansano R D, Salvadori M C, Cattani M, Brown I G

机构信息

Laboratory of Integrated Systems, Polytechnic School, University of São Paulo, Avenida Professor Luciano Gualberto, Travessa R-158, CEP 05508-900 São Paulo, Brazil.

出版信息

Rev Sci Instrum. 2007 May;78(5):053702. doi: 10.1063/1.2736311.

DOI:10.1063/1.2736311

PMID:17552820

Abstract

We describe a nanolithography process for a polymethylmethacrylate (PMMA) surface using scanning contact atomic force microscopy. Parallel furrows were scribed with a pyramidal silicon tip using the same scan mechanism as used to image samples. The PMMA was first electron beam irradiated using a scanning electron microscope and developed. The topography formed is reproducible and predictable. Material from the region where the tip scribes is moved to nearby regions, and aligned, elongated PMMA fragments are seen to decorate the valleys between furrows.

摘要

我们描述了一种使用扫描接触原子力显微镜对聚甲基丙烯酸甲酯（PMMA）表面进行纳米光刻的工艺。使用与对样品成像相同的扫描机制，用金字塔形硅尖端划出平行沟槽。首先使用扫描电子显微镜对PMMA进行电子束辐照并显影。形成的形貌是可重复和可预测的。尖端划过区域的材料会移动到附近区域，并且可以看到排列整齐、拉长的PMMA碎片装饰着沟槽之间的谷底。