Ito S
Appl Opt. 1981 Aug 1;20(15):2706-15. doi: 10.1364/AO.20.002706.
Pulse propagation of beam waves from a source immersed in a slab of scatterers is investigated by means of analytically solving the diffusion equation. The on- and off-axis pulse intensities are calculated for collimated beam waves transmitted in the two typical directions of the slab. To a good approximation, the effect of finite beamwidth on the pulse intensity appears only through the diffusion factor in the radial direction of the beam, resulting in a faster decrease of the intensity in the tail part compared with that of the corresponding plane wave pulse. Also, the pulse shape does not appreciably change when the beamwidth is changed within the range of practical use. An analytical expression is obtained for the pulse width broadening and is applied to several typical cases leading to some simple expressions. The influence of the scatterers existing behind the source is discussed in some detail particularly in connection with pulse shape and width broadening, showing that, in many situations, the pulse width is determined mostly by the total optical thickness of the slab independently of the relative position of the wave source within the slab.
通过解析求解扩散方程,研究了来自浸没在散射体平板中的源的波束波的脉冲传播。计算了在平板的两个典型方向上传输的准直波束波的轴上和离轴脉冲强度。在良好的近似下,有限波束宽度对脉冲强度的影响仅通过波束径向方向上的扩散因子出现,导致尾部强度的下降比相应平面波脉冲更快。此外,当波束宽度在实际使用范围内变化时,脉冲形状没有明显变化。得到了脉冲宽度展宽的解析表达式,并将其应用于几个典型情况,得到了一些简单的表达式。特别详细地讨论了源后面存在的散射体的影响,特别是与脉冲形状和宽度展宽有关的影响,结果表明,在许多情况下,脉冲宽度主要由平板的总光学厚度决定,而与波源在平板内的相对位置无关。