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利用DNA模板制备高度均匀的导电聚吡咯纳米线。

Fabrication of highly uniform conductive polypyrrole nanowires with DNA template.

作者信息

Moon Hock Key, Kim Hyung Jin, Kim Nam-Hoon, Roh Yonghan

机构信息

School of Information and Communication Engineering, Sungkyunkwan University, Suwon 440-746, Korea.

出版信息

J Nanosci Nanotechnol. 2010 May;10(5):3180-4. doi: 10.1166/jnn.2010.2246.

Abstract

Deoxyribonucleic acid (DNA) is considered as one of the alternative materials for electronic device applications; however, DNA has critical limitation to electronic device applications due to its low electrical conductivity and unreliability. Therefore, it is required for electronic devices to prepare the well defined conductive polymer nanowires with DNA as a template. Polypyrrole (PPy) is an attractive polymer due to its high conductivity and environmental stability in bulk; although it is well known that ammonium persulfate (APS) used for the polymerization of pyrrole causes the deformation of DNA molecules. We minimized the damage of immobilized DNA strands on (3-aminopropyl) triethoxysilane (APTES) modified silicon wafer during APS polymerization. Atomic force microscopy (AFM) images from different APS treatment times and from using the vortex process obviously showed the effect on the synthesis of individual and continuous polypyrrole nanowires (PPy NWs). The PPy NWs at various pyrrole concentrations had similar height; however, the higher concentration gave more residues. Fourier transform-infrared spectroscopy (FT-IR) spectroscopy provided the strong evidence that PPy NWs were successfully synthesized on the DNA strands.

摘要

脱氧核糖核酸(DNA)被认为是电子器件应用的替代材料之一;然而,由于其低导电性和不可靠性,DNA在电子器件应用方面存在严重局限性。因此,电子器件需要以DNA为模板制备定义明确的导电聚合物纳米线。聚吡咯(PPy)是一种有吸引力的聚合物,因为其本体具有高导电性和环境稳定性;尽管众所周知,用于吡咯聚合的过硫酸铵(APS)会导致DNA分子变形。我们在APS聚合过程中尽量减少了固定在(3-氨丙基)三乙氧基硅烷(APTES)修饰硅片上的DNA链的损伤。来自不同APS处理时间和使用涡旋过程的原子力显微镜(AFM)图像明显显示了对单个和连续聚吡咯纳米线(PPy NWs)合成的影响。不同吡咯浓度下的PPy NWs具有相似的高度;然而,较高浓度会产生更多残留物。傅里叶变换红外光谱(FT-IR)提供了强有力的证据,证明PPy NWs已成功在DNA链上合成。

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