Zhou H Y, Wang L, Zhu X D, Ke B, Ding F, Wen X H, Wang Y N
CAS Key Laboratory of Basic Plasma Physics, Department of Modern Physics, University of Science and Technology of China, Hefei, Anhui 230026, People's Republic of China.
Rev Sci Instrum. 2010 Mar;81(3):033501. doi: 10.1063/1.3302534.
Hybrid hydrogen plasma was formed by biasing 13.56 MHz radio-frequency (rf) power on a substrate immersed in 2.45 GHz microwave electron cyclotron resonance (ECR) plasma. The influences of the substrate configuration on plasma characteristics were investigated. With increasing rf self-bias voltage, electron temperature, T(e), increases obviously in the case of the single-electrode substrate, whereas a slight change in T(e) was observed with the double-electrode substrate condition. Electron density rises almost with a same magnitude under both two substrate conditions. It exhibited that electron energy and density in ECR-rf hybrid mode could be adjusted independently by controlling rf discharge with favorable substrate configurations.
通过在浸没于2.45GHz微波电子回旋共振(ECR)等离子体中的衬底上施加13.56MHz射频(rf)功率来形成混合氢等离子体。研究了衬底结构对等离子体特性的影响。在单电极衬底的情况下,随着rf自偏压的增加,电子温度T(e)明显升高,而在双电极衬底条件下,T(e)仅有轻微变化。在两种衬底条件下,电子密度几乎以相同的幅度上升。结果表明,通过采用合适的衬底结构控制rf放电,可以独立调节ECR-rf混合模式下的电子能量和密度。