School of Mechanical Engineering, Faculty of Engineering, Tel Aviv University, Tel Aviv 69978, Israel.
Environ Technol. 2010 Feb;31(2):175-83. doi: 10.1080/09593330903414238.
Photodegradation of the antibiotic sulphamethoxazole (SMX) in water using a medium-pressure UV lamp combined with H2O2 (UV/H2O2) was used to generate the advanced oxidation process (AOP). The photodegradation process was steadily improved with addition of H2O2 at relatively low to moderate concentrations (5 to 50 mg L(-1)). However, the addition of H2O2 to the photolysis process at higher concentrations (50 to 150 mg L(-1)) did not improve the degradation rate of SMX (in comparison with 50 mg L(-1) H2O2). Addition of H2O2 to the UV photolysis process resulted in several processes occurring concurrently as follows: (a) formation of HO* radicals which contributed to the SMX degradation, (b) decrease in the available light for direct UV photolysis of SMX, and (c) scavenging of the HO* radicals by H2O2, which was highly dominant at moderate to high concentrations of H2O2. It is clear that these factors, separately and synergistically, and possibly others such as by-product formation, affect the overall difference in SMX degradation in the AOP process at different H2O2 concentrations.
使用中压紫外线灯结合 H2O2（UV/H2O2）对水中的抗生素磺胺甲恶唑（SMX）进行光降解，以产生高级氧化工艺（AOP）。在相对较低到中等浓度（5 至 50mg/L）下添加 H2O2 时，光降解过程会稳定提高。然而，在较高浓度（50 至 150mg/L）下向光解过程中添加 H2O2 不会提高 SMX 的降解速率（与 50mg/L H2O2 相比）。向 UV 光解过程中添加 H2O2 会导致以下几个过程同时发生：（a）形成 HO自由基，这有助于 SMX 的降解，（b）SMX 的直接紫外线光解可用光的减少，以及（c）HO自由基被 H2O2 清除，在中等到高浓度的 H2O2 下，H2O2 非常占主导地位。很明显，这些因素单独或协同作用，以及可能还有其他因素，如副产物的形成，会影响 AOP 过程中不同 H2O2 浓度下 SMX 降解的整体差异。
