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纳米压印诱导的溶液处理次酞菁薄膜中的分子堆积和图案稳定化。

Nanoimprint-induced molecular stacking and pattern stabilization in a solution-processed subphthalocyanine film.

机构信息

Molecular Foundry, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720, USA.

出版信息

ACS Nano. 2010 May 25;4(5):2627-34. doi: 10.1021/nn100075t.

Abstract

We present a systematic study on the thermal nanoimprinting of a boron subphthalocynamine molecule, 2-allylphenoxy-(subphthalocyaninato)boron(III) (SubPc-A), which represents a class of attractive small-molecular weight organic compounds for organic-based photovoltaics (OPV). The final equilibrium imprinted feature profile strongly depends on the imprinting temperature. The highest feature aspect ratio (or contrast) occurs at a specific window of imprinting temperatures (80-90 degrees C). X-ray diffraction indicates that the nanoimprint at such a temperature window can induce high-degree molecular stacking, which can help stabilize the imprinted features. Outside this window, we observed a pronounced relaxation of imprinted features after template removal, which is attributed to the surface diffusion. Key factors affecting the final equilibrium profile of the imprinted features were simulated. From the simulation, it was found that the crystallization-induced anisotropy of surface energy stabilized imprinted features. Simulated parameters such as stable feature aspect ratio and pitch agree well with experimental data. Such work provides an important guideline for optimizing the nanopatterning of small-molecular-weight organic compounds.

摘要

我们对硼次酞菁亚胺分子 2-丙烯基苯氧基-(次酞菁基)硼(III)(SubPc-A)的热纳米压印进行了系统研究,SubPc-A 是一类有吸引力的小分子有机化合物,可用于有机光伏(OPV)。最终的平衡压印特征轮廓强烈依赖于压印温度。在特定的压印温度窗口(80-90°C)下,会出现最高的特征纵横比(或对比度)。X 射线衍射表明,在这样的温度窗口下的纳米压印可以诱导高度分子堆积,这有助于稳定压印特征。在该窗口之外,我们观察到模板去除后压印特征明显弛豫,这归因于表面扩散。模拟了影响压印特征最终平衡轮廓的关键因素。从模拟中可以发现,表面能的结晶诱导各向异性稳定了压印特征。模拟的参数,如稳定的特征纵横比和节距,与实验数据吻合良好。这项工作为优化小分子有机化合物的纳米图案化提供了重要指导。

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