Department of Chemistry, University of Oslo, Centre for Materials Science and Nanotechnology (SMN), FERMiO, Gaustadalléen 21, NO-0349 Oslo, Norway.
Phys Chem Chem Phys. 2010 Jul 7;12(25):6817-25. doi: 10.1039/b925823j. Epub 2010 May 7.
The behaviour of hydrogen in both defect free and acceptor doped bulk rutile TiO2 is investigated through defect calculations performed within the density functional theory formalism. Both interstitial and substitutional hydrogen defects are shown to behave as shallow donors in the material, thereby existing as effectively positive hydroxide defects, OH*(O), and substitutional hydrogen defects, HO. Of the investigated isolated hydrogen defects, the OH(O) defect is shown to have the lowest formation energy over the whole Fermi level range under both oxidising and reducing conditions. However, the formation energy of HO is only 0.35 eV higher under conditions where TiO2 is in equilibrium with Ti2O3, indicating that it exists as a minority defect in rutile TiO2 under highly reducing conditions such as under growth of TiO2 on a Ti metal surface. The enthalpy of hydration of oxygen vacancies is calculated to be -1.64 and -1.60 eV for the 2 x 2 x 3 and 3 x 3 x 3 supercells, indicating that OH(O) defects will prevail in wet atmospheres, even at high temperatures. Hydrogen incorporated in the material can furthermore be expected to associate significantly with various acceptor centres (e.g., substitutional N and Al acceptors and Ti vacancies). The binding energies of the substitutional NH(x)O (imide) defect and of the association complexes between H and fully ionised substitutional Al, (Al'Ti x OH*(O)), and Ti vacancies, (V(Ti)x OH*(O)and (V(Ti) x 4OH*(O)) (i.e., Ruetschi type defects), are calculated to be -0.36, -0.12, -0.47 and -0.82 eV, respectively.
通过在密度泛函理论形式下进行缺陷计算,研究了无缺陷和受主掺杂体金红石 TiO2 中氢的行为。结果表明,间隙和替位氢缺陷在材料中均表现为浅施主,因此实际上是有效正氢氧化物缺陷 OH*(O)和替位氢缺陷 HO。在所研究的孤立氢缺陷中,在整个费米能级范围内,在氧化和还原条件下,OH(O)缺陷的形成能最低。然而,在 TiO2 与 Ti2O3 平衡的条件下,HO 的形成能仅高出 0.35 eV,表明在 Ti 金属表面生长 TiO2 等高度还原条件下,它作为少数缺陷存在于金红石 TiO2 中。氧空位水合焓的计算值分别为 2 x 2 x 3 和 3 x 3 x 3 超胞的-1.64 和-1.60 eV,表明即使在高温下,OH(O)缺陷也将在潮湿气氛中占主导地位。此外,预计材料中掺入的氢会与各种受主中心(例如,替位 N 和 Al 受主和 Ti 空位)显著结合。取代 NH(x)O(酰亚胺)缺陷和 H 与完全离化取代 Al 的缔合复合物(Al'Ti x OH*(O))以及 Ti 空位的缔合复合物(V(Ti)x OH*(O)和(V(Ti) x 4OH*(O))(即 Ruetschi 型缺陷)的结合能分别计算为-0.36、-0.12、-0.47 和-0.82 eV。