Houde-Walter S, Moore D T
Appl Opt. 1988 Feb 1;27(3):508-15. doi: 10.1364/AO.27.000508.
A new instrument for measuring the evolution of index profiles during diffusion in hot (500 degrees C) glass is presented. This instrument, called the oven interferometer, has a spatial resolution of 10 microm at 0.6471 microm and a phase resolution of lambda/50. The development of index profiles with both time-dependent and constant boundary conditions is shown.
介绍了一种用于测量热(500摄氏度)玻璃中扩散过程中折射率分布演变的新仪器。这种仪器称为炉式干涉仪,在波长0.6471微米时空间分辨率为10微米,相位分辨率为λ/50。展示了在随时间变化和恒定边界条件下折射率分布的发展情况。