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新型窄带隙半导体锑酸盐氧化物 RE(3)SbO(3) 和 RE(8)Sb(3-delta)O(8)(RE = La、Sm、Gd 和 Ho)的合成、晶体和电子结构。

Synthesis, crystal and electronic structures of new narrow-band-gap semiconducting antimonide oxides RE(3)SbO(3) and RE(8)Sb(3-delta)O(8), with RE = La, Sm, Gd, and Ho.

机构信息

Department of Chemistry, McMaster University, 1280 Main Street West, Hamilton, Ontario L8S 4M1, Canada.

出版信息

J Am Chem Soc. 2010 Jun 30;132(25):8795-803. doi: 10.1021/ja1027698.

DOI:10.1021/ja1027698
PMID:20524656
Abstract

In the search for high-temperature thermoelectric materials, two families of novel, narrow-band-gap semiconducting antimonide oxides with the compositions RE(3)SbO(3) and RE(8)Sb(3-delta)O(8) (RE = La, Sm, Gd, Ho) have been discovered. Their synthesis was motivated by attempts to open a band gap in the semimetallic RESb binaries through a chemical fusion of RESb and corresponding insulating RE(2)O(3). Temperatures of 1350 degrees C or higher are required to obtain these phases. Both RE(3)SbO(3) and RE(8)Sb(3-delta)O(8) adopt new monoclinic structures with the C2/m space group and feature similar REO frameworks composed of "RE(4)O" tetrahedral units. In both structures, the Sb atoms occupy the empty channels within the REO sublattice. High-purity bulk Sm and Ho samples were prepared and subjected to electrical resistivity measurements. Both the RE(3)SbO(3) and RE(8)Sb(3-delta)O(8) (RE = Sm, Ho) phases exhibit a semiconductor-type electrical behavior. While a small band gap in RE(3)SbO(3) results from the separation of the valence and conduction bands, a band gap in RE(8)Sb(3-delta)O(8) appears to result from the Anderson localization of electrons. The relationship among the composition, crystal structures, and electrical resistivity is analyzed using electronic structure calculations.

摘要

在寻找高温热电材料的过程中,人们发现了两种新型的窄带隙半导体锑氧化物,它们的组成分别为 RE(3)SbO(3)和 RE(8)Sb(3-delta)O(8)(RE = La、Sm、Gd、Ho)。它们的合成是受尝试通过化学融合 RESb 和相应的绝缘 RE(2)O(3)在半金属 RESb 二元体中打开带隙的启发而产生的。要获得这些相,需要 1350 摄氏度或更高的温度。RE(3)SbO(3)和 RE(8)Sb(3-delta)O(8)都采用了新的具有 C2/m 空间群的单斜结构,具有相似的由“RE(4)O”四面体单元组成的 REO 框架。在这两种结构中,Sb 原子占据 REO 亚晶格中的空通道。制备了高纯块状 Sm 和 Ho 样品,并对其进行了电阻率测量。RE(3)SbO(3)和 RE(8)Sb(3-delta)O(8)(RE = Sm、Ho)相都表现出半导体型的电行为。虽然 RE(3)SbO(3)中的小带隙是由于价带和导带的分离造成的,但 RE(8)Sb(3-delta)O(8)中的带隙似乎是由于电子的安德森局域化造成的。利用电子结构计算分析了组成、晶体结构和电阻率之间的关系。

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